Press Release
December 5, 2019  -  Click the title to read the full press release.

ACM Research Announces Wafer Cleaner that Reduces Sulfuric Acid Waste by 80% at 28nm and Lower Nodes



ACM Research, Inc. announced commercial production-line readiness of the world’s first tool that combines bench and single wafer cleaning in an integrated system. The Ultra C ...

ACM Research, Inc.
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