April 25, 2013
KLA-Tencor Announces Novel Defect Discovery and Monitoring Technology
KLA-Tencor Corporation announced NanoPointTM, a new family of patented technologies for its 2900 Series defect inspection system. NanoPoint represents an entirely ...
KLA-Tencor Corporation
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February 27, 2013
KLA-Tencor Announces Two Additions to Litho/Etch Process Control Portfolio
At the SPIE Advanced Lithography conference, KLA-Tencor Corporation announced its SpectraShapeTM 9000 optical critical dimension (CD) metrology system ...
KLA-Tencor Corporation
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January 31, 2013
KLA-Tencor Announces New eS805(TM) Electron-Beam Inspection System
KLA-Tencor Corporation announced the eS805(TM), a new electron-beam inspection system for leading-edge chip manufacturers. Benefiting from more than twenty ...
KLA-Tencor Corporation
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December 6, 2012
KLA-Tencor Launches ICOS(R) WI-2280 Wafer Inspector
KLA-Tencor Corporation announced its next-generation light-emitting diode (LED) patterned wafer inspection tool, the ICOS WI-2280. Designed specifically for defect ...
KLA-Tencor Corporation
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September 10, 2012
KLA-Tencor Announces X5.2TM and TeronTM 611 Reticle Inspection Systems
KLA-Tencor Corporation announced two new additions to the company's IC fab-based reticle inspection portfolio: the X5.2™ and Teron™ 611 systems ...
KLA-Tencor Corporation
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December 14, 2011
KLA-Tencor's SensArray Portfolio Improves Capital ROI & Wafer Temp
KLA-Tencor Corporation introduced new additions to its SensArray portfolio of advanced wireless temperature monitoring wafers. The portfolio implements ...
KLA-Tencor Corporation
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