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  mBGA Flux deposition
with ultrasonic coating technology
mBGAUSI's Prism system delivers high speed flux coating with ultrasonic technology providing more precise uniform coatings than stamping, dipping, jetting or dispensing technology. Learn more...
Ultrasonic Systems, Inc.
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PCD Technology Improves Dispensing
PCD TechnologyVolumetric dispensing improves throughput and dispense quality. PCD technology is compatible with a wide range of viscosities from water to thick pastes. Increase throughput 2–4 times with this new technology, learn more…
GPD Global




Micro Dispensing Technology
Technical white paper
imageThe trend toward micro-dispensing technology increases as electronic assembly's shrink & component packages decrease in size. These requirements often call for tiny dot sizes of paste, epoxy & conductive adhesives. Learn more from this paper…
DL Technology
  Corporate News Index
March 10, 2010  -  Click the title to read the full article.

Novellus Develops Advanced Copper Seed Technology For Through-Silicon-Via (TSV) Packaging
Novellus Systems announced that it has developed a new, advanced copper barrier-seed physical vapor deposition (PVD) process for the emerging ...
Novellus Systems

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More from Novellus Systems
May 11, 2010
Novellus' Tungsten Nitride Process Enables Advanced Copper Interconnects
Novellus Systems announced that it has developed an innovative DirectFill CVD tungsten nitride (WN) liner-barrier film that replaces the conventional ...
Novellus Systems
April 26, 2010
Novellus Develops Precision Anti-Reflective Layers
Novellus Systems announced that it has developed precision anti-reflective layer (ARL) patterning films on its VECTOR PECVD platform ...
Novellus Systems
April 2, 2010
Peter Wolters' Innovative Silicon Wafer Grinding Technology Produces 5x Flatter Wafers
Peter Wolters GmbH announced that it has developed innovative Planetary Pad Grinding (PPG™) technology based on the well-established AC2000 ...
Novellus Systems
March 22, 2010
Novellus Announces Joint Development Program On Copper
Novellus Systems announced the establishment of a joint development program (JDP) with the IBM Corporation to design a manufacturing-worthy ...
Novellus Systems
March 10, 2010
Novellus Develops Advanced Copper Seed Technology For Through-Silicon-Via (TSV) Packaging
Novellus Systems announced that it has developed a new, advanced copper barrier-seed physical vapor deposition (PVD) process for the emerging ...
Novellus Systems
February 4, 2010
Novellus Systems Ships 1000th Vector® PECVD System
Novellus Systems announced that it has shipped the company's 1000th VECTOR plasma-enhanced chemical vapor deposition (PECVD) system to ...
Novellus Systems
November 30, 2009
Novellus' AHM™ PECVD Films Enable SUB-32nm Lithographic Patterning
Novellus Systems has developed a suite of ashable hardmask (AHM) films that have up to 25% greater etch selectivity compared to similar to ...
Novellus Systems
December 9, 2008
Novellus Receives Coveted Supplier Award At TSMC Supply Chain Management Forum
Novellus Systems announced that its industry-leading VECTOR Express™ tool had received the "2008 Excellent Performance in CVD Equipment Award" ...
Novellus Systems
To find more corporate news releases from Novellus Systems, use the search form below.


Ultra Precision Micro Assembly
and High Performance Dispensing
Air-Vac DRS24Unique Benchtop or Cell Systems with flexible design, can be configured to your specific application requirements, learn more…
Air-Vac Engineering




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