Dick James discusses different transistor structures during the evolution of 65-nm technology, and examines the first 45-nm parts introduced in Device Scaling TechXpot

What: Dick James, Senior Technology Analyst, Chipworks, to discuss "65 and 45 nm Devices – an Overview" at SEMICON West in the Challenges in Device Scaling TechXPOT, North Hall, on Tuesday July 15, 2008 @ 10:30 a.m.

Where: Moscone Conference Center, West Hall, Level 2, San Francisco

When: To book ameeting with Dick James, please contact djames@chipworks.com

Presentation Abstract: "65 and 45 nm Devices – an Overview"

Towards the end of 2007 the first 45-nm process node devices were launched by Panasonic and Intel. This node is notable not only for the expected reduction in feature sizes, but also for the introduction of a high-k dielectric and metal gate into the transistor structure. Chipworks, as a supplier of competitive intelligence to the semiconductor and electronics industries, monitors the evolution of chip processes as they come into commercial production.

So far, Intel is the only company using high-k/metal gates in its 45-nm product. Other leading-edge manufacturers have announced that they will start 45-nm production in 2008, but have been less specific as to when they will adopt the new materials. This short talk discusses some of the different transistor structures we have seen during the evolution of 65-nm technology, and examines the first 45-nm parts introduced.

Also Showing

Dick will be demonstrating ICInside Surveyor, a software application for browsing the very high magnification layout images of semiconductors. It is like having a Scanning Electron Microscope on your desktop. Several MEMS parts will be demonstrated, including those from Bosch, Freescale, and SiTime.